Invention Grant
- Patent Title: Techniques for fabricating a non-planar transistor
- Patent Title (中): 制造非平面晶体管的技术
-
Application No.: US12538680Application Date: 2009-08-10
-
Publication No.: US07993988B2Publication Date: 2011-08-09
- Inventor: Werner Juengling
- Applicant: Werner Juengling
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Fletcher Yoder
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/8238

Abstract:
Methods for fabricating a non-planar transistor. Fin field effect transistors (finFETs) are often built around a fin (e.g., a tall, thin semiconductive member). During manufacturing, a fin may encounter various mechanical stresses, e.g., inertial forces during movement of the substrate and fluid forces during cleaning steps. If the forces on the fin are too large, the fin may fracture and possibly render a transistor inoperative. Supporting one side of a fin before forming the second side of a fin creates stability in the fin structure, thereby counteracting many of the mechanical stresses incurred during manufacturing.
Public/Granted literature
- US20090298246A1 TECHNIQUES FOR FABRICATING A NON-PLANAR TRANSISTOR Public/Granted day:2009-12-03
Information query
IPC分类: