Invention Grant
- Patent Title: Method for manufacturing antenna and method for manufacturing semiconductor device
- Patent Title (中): 制造天线的方法及制造半导体器件的方法
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Application No.: US12645511Application Date: 2009-12-23
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Publication No.: US07994030B2Publication Date: 2011-08-09
- Inventor: Tomoyuki Aoki , Daiki Yamada
- Applicant: Tomoyuki Aoki , Daiki Yamada
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2005-158462 20050531
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/36
Abstract:
The present invention provides an antenna with low resistance and a semiconductor device having an antenna whose communication distance is improved. A fluid containing conductive particles is applied over an object. After curing the fluid containing the conductive particles, the fluid is irradiated with a laser to form an antenna. As a method for applying the fluid containing the conductive particles, screen printing, spin coating, dipping, or a droplet discharging method is used. Further, a solid laser having a wavelength of 1 nm or more and 380 nm or less is used as the laser.
Public/Granted literature
- US20100099224A1 METHOD FOR MANUFACTURING ANTENNA AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2010-04-22
Information query
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