Invention Grant
- Patent Title: Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode
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Application No.: US12655435Application Date: 2009-12-30
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Publication No.: US07994053B2Publication Date: 2011-08-09
- Inventor: Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-Hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
- Applicant: Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-Hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
- Applicant Address: KR Jang-Dong, Yuseong-Ku, Daejon
- Assignee: Korea Institute of Machinery & Materials
- Current Assignee: Korea Institute of Machinery & Materials
- Current Assignee Address: KR Jang-Dong, Yuseong-Ku, Daejon
- Agency: Lexyoume IP Group, PLLC.
- Priority: KR10-2009-0082592 20090902
- Main IPC: H01L21/44
- IPC: H01L21/44
Abstract:
A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.
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