Invention Grant
US07994057B2 Polishing composition and method utilizing abrasive particles treated with an aminosilane
有权
使用用氨基硅烷处理的磨料颗粒的抛光组合物和方法
- Patent Title: Polishing composition and method utilizing abrasive particles treated with an aminosilane
- Patent Title (中): 使用用氨基硅烷处理的磨料颗粒的抛光组合物和方法
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Application No.: US12234173Application Date: 2008-09-19
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Publication No.: US07994057B2Publication Date: 2011-08-09
- Inventor: Jeffrey Dysard , Sriram Anjur , Steven Grumbine , Daniela White , William Ward
- Applicant: Jeffrey Dysard , Sriram Anjur , Steven Grumbine , Daniela White , William Ward
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas E. Omholt; Nancy J. Gettel; Steven D. Weseman
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461
Abstract:
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier, a cationic polymer, an acid, and abrasive particles that have been treated with an aminosilane compound.
Public/Granted literature
- US20090081871A1 POLISHING COMPOSITION AND METHOD UTILIZING ABRASIVE PARTICLES TREATED WITH AN AMINOSILANE Public/Granted day:2009-03-26
Information query
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