Invention Grant
- Patent Title: Semiconductor devices with non-punch-through semiconductor channels having enhanced conduction and methods of making
- Patent Title (中): 具有非穿通半导体通道的半导体器件具有增强的传导和制造方法
-
Application No.: US12170599Application Date: 2008-07-10
-
Publication No.: US07994548B2Publication Date: 2011-08-09
- Inventor: David C. Sheridan , Andrew Ritenour
- Applicant: David C. Sheridan , Andrew Ritenour
- Applicant Address: US MI Starkville
- Assignee: Semisouth Laboratories, Inc.
- Current Assignee: Semisouth Laboratories, Inc.
- Current Assignee Address: US MI Starkville
- Agency: Morris, Manning & Martin, LLP
- Agent Christopher W. Raimund
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
Semiconductor devices are described wherein current flow in the device is confined between the rectifying junctions (e.g., p-n junctions or metal-semiconductor junctions). The device provides non-punch-through behavior and enhanced current conduction capability. The devices can be power semiconductor devices as such as Junction Field-Effect Transistors (VJFETs), Static Induction Transistors (SITs), Junction Field Effect Thyristors, or JFET current limiters. The devices can be made in wide bandgap semiconductors such as silicon carbide (SiC). According to some embodiments, the device can be a normally-off SiC vertical junction field effect transistor. Methods of making the devices and circuits comprising the devices are also described.
Public/Granted literature
Information query
IPC分类: