Invention Grant
- Patent Title: Spin transistor using perpendicular magnetization
- Patent Title (中): 旋转晶体管使用垂直磁化
-
Application No.: US11949659Application Date: 2007-12-03
-
Publication No.: US07994555B2Publication Date: 2011-08-09
- Inventor: Hyun-Cheol Koo , Suk-Hee Han , Joon-Yeon Chang , Hyung-Jun Kim , Jin-Seock Ma
- Applicant: Hyun-Cheol Koo , Suk-Hee Han , Joon-Yeon Chang , Hyung-Jun Kim , Jin-Seock Ma
- Applicant Address: KR
- Assignee: Korea Institute of Science and Technology
- Current Assignee: Korea Institute of Science and Technology
- Current Assignee Address: KR
- Agency: Wells St. John P.S.
- Priority: KR10-2007-0058532 20070614
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
A spin transistor useful for device miniaturization and high-density integration is provided. The spin transistor includes: a semiconductor substrate including a channel layer; ferromagnetic source and drain disposed on the semiconductor substrate to be separated from each other and to be magnetized in a direction perpendicular to a surface of the channel layer; a gate formed on the semiconductor substrate between the source and the drain to adjust spins of electrons passing through the channel layer, wherein spin-polarized electrons are injected from the source to the channel layer, and the electrons injected into the channel layer pass though the channel layer and are injected into the drain, and wherein the spins of the electrons passing through the channel layer undergo precession due to a spin-orbit coupling induced magnetic field according to a voltage of the gate.
Public/Granted literature
- US20080308844A1 Spin Transistor Using Perpendicular Magnetization Public/Granted day:2008-12-18
Information query
IPC分类: