Invention Grant
US07994573B2 Structure and method for forming power devices with carbon-containing region
有权
用于形成具有含碳区域的功率器件的结构和方法
- Patent Title: Structure and method for forming power devices with carbon-containing region
- Patent Title (中): 用于形成具有含碳区域的功率器件的结构和方法
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Application No.: US12334393Application Date: 2008-12-12
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Publication No.: US07994573B2Publication Date: 2011-08-09
- Inventor: James Pan
- Applicant: James Pan
- Applicant Address: US CA San Jose
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A field effect transistor (FET) includes body regions of a first conductivity type over a semiconductor region of a second conductivity type. The body regions form p-n junctions with the semiconductor region. Source regions of the second conductivity type extend over the body regions. The source regions form p-n junctions with the body regions. Gate electrodes extend adjacent to but are insulated from the body regions by a gate dielectric. A carbon-containing region extends in the semiconductor region below the body regions.
Public/Granted literature
- US20090302381A1 Structure and Method for Forming Power Devices with Carbon-containing Region Public/Granted day:2009-12-10
Information query
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