Invention Grant
- Patent Title: Inductive plasma applicator
- Patent Title (中): 感应式等离子体涂布机
-
Application No.: US12412553Application Date: 2009-03-27
-
Publication No.: US07994724B2Publication Date: 2011-08-09
- Inventor: Sébastien Dine
- Applicant: Sébastien Dine
- Applicant Address: FR Palaiseau FR Paris
- Assignee: Ecole Polytechnique,Centre National de la Recherche Scientifique-CNRS
- Current Assignee: Ecole Polytechnique,Centre National de la Recherche Scientifique-CNRS
- Current Assignee Address: FR Palaiseau FR Paris
- Agency: Miller, Matthias & Hull LLP
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
An inductive plasma applicator comprises a ferromagnetic inductively coupled source and an electrode with a hole pattern centered with respect to the plasma source. Such plasma applicator provides an efficient energy transfer to the plasma. The plasma applicator is preferably manufactured using a technology for producing electrical circuits. The electrode and a coil of the ferromagnetic inductively coupled plasma source are metal track portions formed on an insulating substrate. For example, the plasma applicator is manufactured using printed circuit board technology.
Public/Granted literature
- US20100244699A1 Inductive Plasma Applicator Public/Granted day:2010-09-30
Information query