Invention Grant
- Patent Title: Measurement method, measurement apparatus, exposure apparatus, and device fabrication method
- Patent Title (中): 测量方法,测量装置,曝光装置和装置制造方法
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Application No.: US12830213Application Date: 2010-07-02
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Publication No.: US07995213B2Publication Date: 2011-08-09
- Inventor: Osamu Kakuchi , Yoshiyuki Kuramoto
- Applicant: Osamu Kakuchi , Yoshiyuki Kuramoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. I.P. Division
- Priority: JP2007-121164 20070501
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.
Public/Granted literature
- US20100265515A1 MEASUREMENT METHOD, MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD Public/Granted day:2010-10-21
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