Invention Grant
US07995216B2 Control of the positional relationship between a sample collection instrument and a surface to be analyzed during a sampling procedure with image analysis 有权
通过图像分析控制采样过程中样品采集仪与待分析表面之间的位置关系

  • Patent Title: Control of the positional relationship between a sample collection instrument and a surface to be analyzed during a sampling procedure with image analysis
  • Patent Title (中): 通过图像分析控制采样过程中样品采集仪与待分析表面之间的位置关系
  • Application No.: US12217224
    Application Date: 2008-07-02
  • Publication No.: US07995216B2
    Publication Date: 2011-08-09
  • Inventor: Gary J. Van BerkelVilmos Kertesz
  • Applicant: Gary J. Van BerkelVilmos Kertesz
  • Applicant Address: US TN Oak Ridge
  • Assignee: UT-Battelle, LLC
  • Current Assignee: UT-Battelle, LLC
  • Current Assignee Address: US TN Oak Ridge
  • Agent Michael E. McKee
  • Main IPC: G01B11/14
  • IPC: G01B11/14 G01N1/02 H01J37/26
Control of the positional relationship between a sample collection instrument and a surface to be analyzed during a sampling procedure with image analysis
Abstract:
A system and method utilizes an image analysis approach for controlling the collection instrument-to-surface distance in a sampling system for use, for example, with mass spectrometric detection. Such an approach involves the capturing of an image of the collection instrument or the shadow thereof cast across the surface and the utilization of line average brightness (LAB) techniques to determine the actual distance between the collection instrument and the surface. The actual distance is subsequently compared to a target distance for re-optimization, as necessary, of the collection instrument-to-surface during an automated surface sampling operation.
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