Invention Grant
- Patent Title: Semiconductor storage device and manufacturing method thereof
- Patent Title (中): 半导体存储装置及其制造方法
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Application No.: US12329851Application Date: 2008-12-08
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Publication No.: US07995376B2Publication Date: 2011-08-09
- Inventor: Daisuke Yamazaki
- Applicant: Daisuke Yamazaki
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: SNR Denton US LLP
- Priority: JP2007-319327 20071211
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
A semiconductor storage device includes a plurality of integrated memory cells. Each cell includes a first inverter having a first driver transistor and a first load transistor which are formed on a semiconductor substrate in order to form a first storage node, a second inverter having a second driver transistor and a second load transistor which are formed on the semiconductor substrate in order to form a second storage node, a first transfer transistor connected between the first storage node and a bit line to serve as a transistor connecting the memory cell to the bit line, and a second transfer transistor connected between the second storage node and a complementary-bit line to serve as a transistor connecting the memory cell to the complementary-bit line.
Public/Granted literature
- US20090146188A1 SEMICONDUCTOR STORAGE DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-06-11
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