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US07995376B2 Semiconductor storage device and manufacturing method thereof 失效
半导体存储装置及其制造方法

Semiconductor storage device and manufacturing method thereof
Abstract:
A semiconductor storage device includes a plurality of integrated memory cells. Each cell includes a first inverter having a first driver transistor and a first load transistor which are formed on a semiconductor substrate in order to form a first storage node, a second inverter having a second driver transistor and a second load transistor which are formed on the semiconductor substrate in order to form a second storage node, a first transfer transistor connected between the first storage node and a bit line to serve as a transistor connecting the memory cell to the bit line, and a second transfer transistor connected between the second storage node and a complementary-bit line to serve as a transistor connecting the memory cell to the complementary-bit line.
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