Invention Grant
- Patent Title: Electrically isolated gated diode nonvolatile memory
- Patent Title (中): 电隔离门控二极管非易失性存储器
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Application No.: US12192797Application Date: 2008-08-15
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Publication No.: US07995384B2Publication Date: 2011-08-09
- Inventor: Tien-Fan Ou , Wen-Jer Tsai , Jyun-Siang Huang
- Applicant: Tien-Fan Ou , Wen-Jer Tsai , Jyun-Siang Huang
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: G11C11/36
- IPC: G11C11/36

Abstract:
A gated diode nonvolatile memory cell with a charge storage structure includes a diode structure with an additional gate terminal. Adjacent memory devices are electrically isolated. Example embodiments include the individual memory cell, an array of such memory cells, methods of operating the memory cell or array of memory cells, and methods of manufacturing the same.
Public/Granted literature
- US20100039867A1 Electrically Isolated Gated Diode Nonvolatile Memory Public/Granted day:2010-02-18
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