Invention Grant
US07995390B2 NAND flash memory array with cut-off gate line and methods for operating and fabricating the same
有权
具有截止栅极线的NAND闪存阵列及其操作和制造方法
- Patent Title: NAND flash memory array with cut-off gate line and methods for operating and fabricating the same
- Patent Title (中): 具有截止栅极线的NAND闪存阵列及其操作和制造方法
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Application No.: US12361107Application Date: 2009-01-28
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Publication No.: US07995390B2Publication Date: 2011-08-09
- Inventor: Byung-Gook Park , Seong Jae Cho
- Applicant: Byung-Gook Park , Seong Jae Cho
- Applicant Address: KR
- Assignee: Seoul National University Industry Foundation
- Current Assignee: Seoul National University Industry Foundation
- Current Assignee Address: KR
- Agent Gerald E. Hespos; Michael J. Porco
- Priority: KR10-2008-0014125 20080215
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A NAND flash memory array, an operating method and a fabricating method of the same are provided. The NAND flash memory array has a cut-off gate line under a control gate in order to operate two cells having vertical channels independently with one control gate (i.e., a shared word line). The memory cell area is reduced considerably compared to the conventional vertical channel structure, and is better for high integration. A shared cut-off gate turn off is made during a programming operation and prevents programming the opposite cell by a self-boosting effect. It is possible to shield electrically with a shared word line (a control gate) during a reading operation, and minimizes the effect of storage condition of the opposite cell. Also, the NAND flash memory array can be fabricated by using the conventional CMOS process.
Public/Granted literature
- US20090207667A1 NAND FLASH MEMORY ARRAY WITH CUT-OFF GATE LINE AND METHODS FOR OPERATING AND FABRICATING THE SAME Public/Granted day:2009-08-20
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