Invention Grant
- Patent Title: Multiple select gates with non-volatile memory cells
- Patent Title (中): 具有非易失性存储单元的多个选择门
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Application No.: US12868245Application Date: 2010-08-25
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Publication No.: US07995391B2Publication Date: 2011-08-09
- Inventor: Seiichi Aritome
- Applicant: Seiichi Aritome
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Brooks, Cameron & Huebsch, PLLC
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
Multiple select gates in association with non-volatile memory cells are described. Various embodiments include multiple select gate structure, process, and operation and their applicability for memory devices, modules, and systems. In one embodiment a memory array is described. The memory array includes a number of select gates coupled in series to a number of non-volatile memory cells. A first select gate includes a control gate and a floating gate electrically connected together and a second select gate includes a control gate and a floating gate which are electrically separated by a dielectric layer.
Public/Granted literature
- US20100323480A1 MULTIPLE SELECT GATES WITH NON-VOLATILE MEMORY CELLS Public/Granted day:2010-12-23
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