Invention Grant
- Patent Title: Nitride semiconductor laser chip and fabrication method thereof
- Patent Title (中): 氮化物半导体激光芯片及其制造方法
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Application No.: US12155186Application Date: 2008-05-30
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Publication No.: US07995632B2Publication Date: 2011-08-09
- Inventor: Fumio Yamashita , Shigetoshi Ito , Shuichiro Yamamoto , Toshiyuki Kawakami
- Applicant: Fumio Yamashita , Shigetoshi Ito , Shuichiro Yamamoto , Toshiyuki Kawakami
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2007-144428 20070531
- Main IPC: H01S3/04
- IPC: H01S3/04 ; H01S3/20

Abstract:
In a nitride semiconductor laser chip so structured as to suppress development of a step on nitride semiconductor layers, the substrate has the (1-100) plane as the principal plane, the resonator facet is perpendicular to the principal plane, and, in the cleavage surface forming the resonator facet, at least by one side of a stripe-shaped waveguide, an etched-in portion is formed as an etched-in region open toward the surface of the nitride semiconductor layers.
Public/Granted literature
- US20080298409A1 Nitride semiconductor laser chip and fabrication method thereof Public/Granted day:2008-12-04
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