Invention Grant
- Patent Title: Gas discharge laser chamber
- Patent Title (中): 气体放电激光室
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Application No.: US12603486Application Date: 2009-10-21
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Publication No.: US07995637B2Publication Date: 2011-08-09
- Inventor: Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
- Applicant: Richard L. Sandstrom , William N. Partlo , Daniel J. W. Brown , Bryan G. Moosman , Tae H. Chung , Thomas P. Duffey , James J. Ferrell , Terance Hilsabeck
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agency: Martine Penilla & Gencarella, LLP
- Main IPC: H01S3/22
- IPC: H01S3/22

Abstract:
One aspect of the disclosed subject matter describes a gas discharge laser chamber. The gas discharge laser chamber includes a discharge region formed between a first electrode and a second electrode, a tangential fan for circulating gas through the discharge region, wherein the fan is proximate to an input side of the discharge region, an input side acoustic baffle proximate to the input side of the discharge region. The input side acoustic baffle includes a vanishing point leading edge, a vanishing point trailing edge, a gas flow smoothing offset surface aligning a gas flow from a surface of the input side acoustic baffle to an input side of a cathode support in the discharge region, a plurality of ridges separated by a plurality of trenches, wherein the plurality of ridges and the plurality of trenches are aligned with a direction of gas flow through the discharge region and wherein the plurality of ridges have a random pitch between about 0.3 and about 0.7 inch.
Public/Granted literature
- US20100142582A1 GAS DISCHARGE LASER CHAMBER Public/Granted day:2010-06-10
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