Invention Grant
- Patent Title: Method for controlling X-ray exposure in X-ray CT system
- Patent Title (中): X射线CT系统中X射线曝光控制方法
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Application No.: US12342434Application Date: 2008-12-23
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Publication No.: US07995703B2Publication Date: 2011-08-09
- Inventor: Xiongwei Yan
- Applicant: Xiongwei Yan
- Applicant Address: US WI Waukesha
- Assignee: GE Medical Systems Global Technology Company, LLC
- Current Assignee: GE Medical Systems Global Technology Company, LLC
- Current Assignee Address: US WI Waukesha
- Agency: Armstrong Teasdale LLP
- Priority: CN200710308137 20071229
- Main IPC: H05G1/10
- IPC: H05G1/10 ; H05G1/34 ; G01N23/083

Abstract:
A method for controlling automatic X-ray exposure in an X-ray CT system includes establishing a correspondence table or function relationship between a ratio factor and an offset of a geometrical center of a scanned section, wherein the ratio factor represents a ratio of the projection area value when the geometrical center of the scanned section of a subject deviates from a rotation center to the standard projection area value when the geometrical center of the scanned section of the subject locates at the rotation center, scout scanning the subject, and calculating a “measured projection area value” and Projection Measure based on the scout scan data, calculating the offset of the geometrical center of the scanned section from the rotation center, substituting the offset into the correspondence table or function relationship to obtain a corresponding ratio factor, calculating the standard projection area value based on the ratio factor and the measured projection area value, and automatically determining by an automatic exposure function a tube current value required for exposure based on the calculated standard projection area value, the Projection Measure.
Public/Granted literature
- US20090168951A1 METHOD FOR CONTROLLING X-RAY EXPOSURE IN X-RAY CT SYSTEM Public/Granted day:2009-07-02
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