Invention Grant
- Patent Title: Particle trap
- Patent Title (中): 粒子陷阱
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Application No.: US12327888Application Date: 2008-12-04
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Publication No.: US08000080B2Publication Date: 2011-08-16
- Inventor: Stephen E. Krause , Russell J. Low , Kasegn D. Tekletsadik
- Applicant: Stephen E. Krause , Russell J. Low , Kasegn D. Tekletsadik
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01T23/00
- IPC: H01T23/00 ; H01P1/10 ; H01H47/00

Abstract:
An apparatus and method for trapping particles in a housing is disclosed. A high voltage terminal/structure is situated within a housing. A conductive material, having a plurality of holes, such as a mesh, is disposed a distance away from an interior surface of the housing, such as the floor of the housing, forming a particle trap. The conductive mesh is biased so that the electrical field within the trap is either non-existent or pushing toward the floor, so as to retain particles within the trap. Additionally, a particle mover, such as a fan or mechanical vibration device, can be used to urge particles into the openings in the mesh. Furthermore, a conditioning phase may be used prior to operating the high voltage terminal, whereby a voltage is applied to the conductive mesh so as to attract particles toward the particle trap.
Public/Granted literature
- US20090147435A1 PARTICLE TRAP Public/Granted day:2009-06-11
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