Invention Grant
- Patent Title: Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure
- Patent Title (中): 催化增强化学气相沉积装置具有有效的灯丝排列结构
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Application No.: US11439350Application Date: 2006-05-24
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Publication No.: US08006639B2Publication Date: 2011-08-30
- Inventor: Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
- Applicant: Han-Ki Kim , Myung-Soo Huh , Myoung-Soo Kim , Kyu-Sung Lee
- Applicant Address: KR Nongseo-Dong, Giheung-Gu, Yongin, Gyunggi-Do
- Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee: Samsung Mobile Display Co., Ltd.
- Current Assignee Address: KR Nongseo-Dong, Giheung-Gu, Yongin, Gyunggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2005-0043827 20050524
- Main IPC: C23C16/00
- IPC: C23C16/00
Abstract:
The present invention provides a catalytic enhanced chemical vapor deposition (CVD) apparatus capable of maximizing efficiency of gas use to 80% or more, and obtaining a uniform thin film by efficiently arranging filaments mounted on a shower head of the catalytic enhanced CVD apparatus, thereby uniformly decomposing a deposition source gas. The present invention also provides a method for fabricating an organic electroluminescent device with an inorganic film formed through the catalytic enhanced CVD apparatus.
Public/Granted literature
- US20060269671A1 Catalytic enhanced chemical vapor deposition apparatus having efficient filament arrangement structure Public/Granted day:2006-11-30
Information query
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