Invention Grant
US08006760B2 Clean fluid systems for partial monolayer fracturing 有权
用于局部单层压裂的清洁流体系统

Clean fluid systems for partial monolayer fracturing
Abstract:
Provided are methods that include a method comprising: placing a clean fluid comprising proppant particulates into a portion of a fracture in a subterranean formation, and depositing one or more of the proppant particulates into the fracture to form a partial monolayer. In another aspect, the invention provides methods that include placing a degradable fluid loss additive comprising collagen into a subterranean formation.
Public/Granted literature
Information query
Patent Agency Ranking
0/0