Invention Grant
- Patent Title: Cleaning blade, method of fabricating cleaning blade, and cleaning apparatus for liquid discharge head
- Patent Title (中): 清洁刀片，清洁刮板的制造方法以及排液头的清洗装置
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Application No.: US11716882Application Date: 2007-03-12
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Publication No.: US08007072B2Publication Date: 2011-08-30
- Inventor: Shota Nishi , Shigeyoshi Fujiki , Manabu Matsuda , Yuji Yakura , Makoto Ando
- Applicant: Shota Nishi , Shigeyoshi Fujiki , Manabu Matsuda , Yuji Yakura , Makoto Ando
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rockey, Depke & Lyons, LLC
- Agent Robert J. Depke
- Priority: JPP2006-085986 20060327
- Main IPC: B41J2/165
- IPC: B41J2/165
Abstract:
A cleaning blade which wipes a liquid discharge area by being moved relatively with respect to the liquid discharge area of a liquid discharge head having the liquid discharge area in which liquid discharge nozzles are arranged to discharge a liquid is disclosed. The cleaning blade includes: a supporting plate which has an adhesive agent layer on its front surface; and a wipe part which is slid and contacted with the liquid discharge area, the wipe part formed in which an elastic part formed of a synthetic resin is formed in one piece on the adhesive agent layer, and a tip end thereof is cut in a predetermined shape.
Public/Granted literature
- US20070222816A1 Cleaning blade, method fabricating cleaning blade, and cleaning apparatus for liquid discharge head Public/Granted day:2007-09-27
Information query
IPC分类:
