Invention Grant
US08007676B2 Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions
有权
浆料组合物，制备浆料组合物的方法，以及使用浆料组合物抛光物体的方法
- Patent Title: Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions
- Patent Title (中): 浆料组合物，制备浆料组合物的方法，以及使用浆料组合物抛光物体的方法
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Application No.: US12128675Application Date: 2008-05-29
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Publication No.: US08007676B2Publication Date: 2011-08-30
- Inventor: Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
- Applicant: Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR2004-64977 20040818
- Main IPC: C03C15/00
- IPC: C03C15/00
Abstract:
A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.
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