Invention Grant
- Patent Title: Coating liquid for nickel film formation, nickel film, and production method thereof
- Patent Title (中): 镍膜形成用涂布液,镍膜及其制造方法
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Application No.: US11922319Application Date: 2006-06-16
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Publication No.: US08007692B2Publication Date: 2011-08-30
- Inventor: Yoshihiro Otsuka , Masaya Yukinobu
- Applicant: Yoshihiro Otsuka , Masaya Yukinobu
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Metal Mining Co., Ltd.
- Current Assignee: Sumitomo Metal Mining Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Dykema Gossett PLLC
- Priority: JP2005-177186 20050617
- International Application: PCT/JP2006/312666 WO 20060616
- International Announcement: WO2006/135113 WO 20061221
- Main IPC: H01B1/02
- IPC: H01B1/02

Abstract:
It is aimed at providing: a coating liquid for nickel film formation suitable for forming a nickel film combinedly possessing an excellent electroconductivity and an excellent film-forming ability (surface flatness), by a coating method, particularly inkjet printing; a nickel film obtained by using the nickel film formation coating liquid; and a production method of such a nickel film.A coating liquid for nickel film formation comprises: nickel formate; and an amine based solvent having a boiling point within a range between 180° C. inclusive and 300° C. exclusive, as a main solvent, thereby allowing obtainment of a coating liquid for nickel film formation suitable for inkjet printing; and there can be obtained a uniform and flat nickel film having a low resistance and being excellent in film strength (adhesion force), by coating the nickel film formation coating liquid onto a substrate; drying the coated coating liquid; and subsequently calcining the dried coating liquid at a temperature of 200° C. or higher in an inert atmosphere or reducing atmosphere.
Public/Granted literature
- US20090035472A1 Coating Liquid For Nickel Film Formation, Nickel Film, and Production Method Thereof Public/Granted day:2009-02-05
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