Invention Grant
- Patent Title: Photomask and pattern formation method using the same
- Patent Title (中): 光掩模和图案形成方法使用它
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Application No.: US12181650Application Date: 2008-07-29
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Publication No.: US08007959B2Publication Date: 2011-08-30
- Inventor: Yuji Nonami , Akio Misaka , Shigeo Irie
- Applicant: Yuji Nonami , Akio Misaka , Shigeo Irie
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-222142 20070829
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F9/00 ; H01L21/00
Abstract:
A photomask includes a transparent substrate having a transparent property against exposing light and a halftone portion formed on the transparent substrate. In the halftone portion, a first opening having a first dimension and a second opening having a second dimension larger than the first dimension are formed. A light-shielding portion is formed on the transparent substrate to be disposed around the second opening.
Public/Granted literature
- US20090061328A1 PHOTOMASK AND PATTERN FORMATION METHOD USING THE SAME Public/Granted day:2009-03-05
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