Invention Grant
- Patent Title: Photomask
- Patent Title (中): 光掩模
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Application No.: US12585922Application Date: 2009-09-29
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Publication No.: US08007962B2Publication Date: 2011-08-30
- Inventor: Keisuke Hatano , Takeshi Matsunuma , Shinji Miyazawa
- Applicant: Keisuke Hatano , Takeshi Matsunuma , Shinji Miyazawa
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2008-294877 20081118
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F1/08
Abstract:
A photomask includes a base, a plurality of chip pattern regions over which a light shielding pattern of a metal material is defined, the plurality of chip pattern regions being defined on the base, scribe regions defined between the chip pattern regions, the scribe regions being defined by using the light shielding pattern, and slits in which the light shielding pattern is not defined, the slits being defined so as to surround the chip pattern regions.
Public/Granted literature
- US20100124710A1 Photomask Public/Granted day:2010-05-20
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