Invention Grant
- Patent Title: Resist for printing and patterning method using the same
- Patent Title (中): 抗印刷和图案化方法使用它
-
Application No.: US11790464Application Date: 2007-04-25
-
Publication No.: US08007980B2Publication Date: 2011-08-30
- Inventor: Jin Wuk Kim
- Applicant: Jin Wuk Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge, L.L.P.
- Priority: KR10-2006-0037777 20060426
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/20

Abstract:
A resist for printing that is coated on a printing roll and is then sequentially transcribed on a printing plate and a substrate including: a material wherein a cohesive energy between the resist and the printing plate is larger than a cohesive energy between the resist and a blanket formed on the surface of printing roll, and wherein a cohesive energy between the resist and the substrate is larger than the cohesive energy between the resist and the blanket formed on the surface of printing roll.
Public/Granted literature
- US20070254239A1 Resist for printing and patterning method using the same Public/Granted day:2007-11-01
Information query