Invention Grant
- Patent Title: Maxim electron scatter chamber
- Patent Title (中): Maxim电子散射室
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Application No.: US12496071Application Date: 2009-07-01
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Publication No.: US08008640B2Publication Date: 2011-08-30
- Inventor: Joseph E. Maxim , Jack A. Neal , Alejandro Castillo
- Applicant: Joseph E. Maxim , Jack A. Neal , Alejandro Castillo
- Applicant Address: US TX College Station
- Assignee: The Texas A&M University System
- Current Assignee: The Texas A&M University System
- Current Assignee Address: US TX College Station
- Agency: Chalker Flores, LLP
- Agent Chainey P. Singleton; Edwin S. Flores
- Main IPC: A23L3/00
- IPC: A23L3/00 ; A23L3/26
Abstract:
The present invention includes a system, methods and apparatus for sterilization of an object (e.g., food products). The present invention takes advantage of the electron scatter that occurs when electron beam is applied onto a surface. The present invention is capable of treating irregular surfaces (e.g., carcasses, spherical/round surfaces) or any type of surface where complete penetration is not needed or desired.
Public/Granted literature
- US20100001206A1 MAXIM ELECTRON SCATTER CHAMBER Public/Granted day:2010-01-07
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