Invention Grant
US08008655B2 Nitride compound semiconductor device including organic semiconductor layer under gate electrode
有权
氮化物化合物半导体器件包括栅电极下的有机半导体层
- Patent Title: Nitride compound semiconductor device including organic semiconductor layer under gate electrode
- Patent Title (中): 氮化物化合物半导体器件包括栅电极下的有机半导体层
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Application No.: US12244046Application Date: 2008-10-02
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Publication No.: US08008655B2Publication Date: 2011-08-30
- Inventor: Shinichi Iwakami
- Applicant: Shinichi Iwakami
- Applicant Address: JP Niiza-shi
- Assignee: Sanken Electric Co., Ltd.
- Current Assignee: Sanken Electric Co., Ltd.
- Current Assignee Address: JP Niiza-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-291152 20071108
- Main IPC: H01L51/05
- IPC: H01L51/05

Abstract:
A nitride compound semiconductor device includes a semiconductor layer including a group III nitride compound semiconductor, source and drain electrodes provided on the semiconductor layer, an insulating film provided on the semiconductor layer between the source electrode and the drain electrode, an organic semiconductor layer in contact with the semiconductor layer at an opening provided for the insulating film, and a gate electrode provided on the organic conductive layer at the opening.
Public/Granted literature
- US20090121217A1 NITRIDE COMPOUND SEMICONDUCTOR DEVICE INCLUDING ORGANIC SEMICONDUCTOR LAYER UNDER GATE ELECTRODE Public/Granted day:2009-05-14
Information query
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