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US08008655B2 Nitride compound semiconductor device including organic semiconductor layer under gate electrode 有权
氮化物化合物半导体器件包括栅电极下的有机半导体层

Nitride compound semiconductor device including organic semiconductor layer under gate electrode
Abstract:
A nitride compound semiconductor device includes a semiconductor layer including a group III nitride compound semiconductor, source and drain electrodes provided on the semiconductor layer, an insulating film provided on the semiconductor layer between the source electrode and the drain electrode, an organic semiconductor layer in contact with the semiconductor layer at an opening provided for the insulating film, and a gate electrode provided on the organic conductive layer at the opening.
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