Invention Grant
- Patent Title: Multi-transistor non-volatile memory element
- Patent Title (中): 多晶体管非易失性存储元件
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Application No.: US12034386Application Date: 2008-02-20
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Publication No.: US08008702B2Publication Date: 2011-08-30
- Inventor: Shih Wei Wang , Chun Jung Lin
- Applicant: Shih Wei Wang , Chun Jung Lin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
A multi-transistor element including a substrate, a first floating gate disposed on the substrate, a second floating gate disposed on the substrate and coupled to the first floating gate, and a first active region disposed in the substrate and coupled to the first and second floating gates.
Public/Granted literature
- US20090207662A1 Multi-Transistor Non-Volatile Memory Element Public/Granted day:2009-08-20
Information query
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