Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12094775Application Date: 2007-09-05
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Publication No.: US08008767B2Publication Date: 2011-08-30
- Inventor: Masahiro Wada , Hiroyuki Tanaka , Hiroshi Hirose , Teppei Itoh , Kenya Tachibana
- Applicant: Masahiro Wada , Hiroyuki Tanaka , Hiroshi Hirose , Teppei Itoh , Kenya Tachibana
- Applicant Address: JP Shinagawa-Ku, Tokyo
- Assignee: Sumitomo Bakelight Co., Ltd.
- Current Assignee: Sumitomo Bakelight Co., Ltd.
- Current Assignee Address: JP Shinagawa-Ku, Tokyo
- Agency: Sheldon Mak & Anderson
- Agent Laura M. Lloyd; Jeffrey G. Sheldon
- Priority: JP2006-248473 20060913
- International Application: PCT/JP2007/067283 WO 20070905
- International Announcement: WO2008/032620 WO 20080320
- Main IPC: H01L23/18
- IPC: H01L23/18 ; H01L23/498

Abstract:
The invention offers technology for suppressing damage to semiconductor devices due to temperature changes. When flip-chip mounting a silicon chip on a buildup type multilayer substrate having a structure with a thinned core, a core having a small coefficient of thermal expansion is used in the multilayer substrate, and the coefficient of thermal expansion and glass transition point of the underfill are appropriately designed in accordance with the thickness and coefficient of thermal expansion of the core. By doing so, it is possible to relieve stresses inside the semiconductor package caused by deformation of the multilayer substrate due to temperature changes, and thereby to suppress damage to the semiconductor package due to temperature changes.
Public/Granted literature
- US20090267212A1 Semiconductor Device Public/Granted day:2009-10-29
Information query
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