Invention Grant
- Patent Title: Uniform background radiation in maskless lithography
- Patent Title (中): 无掩模光刻中的均匀背景辐射
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Application No.: US11689926Application Date: 2007-03-22
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Publication No.: US08009270B2Publication Date: 2011-08-30
- Inventor: Paul Antoon Cyriel Desmedt , Patricius Aloysius Jacobus Tinnemans , Minne Cuperus
- Applicant: Paul Antoon Cyriel Desmedt , Patricius Aloysius Jacobus Tinnemans , Minne Cuperus
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.
Public/Granted literature
- US20080231826A1 UNIFORM BACKGROUND RADIATION IN MASKLESS LITHOGRAPHY Public/Granted day:2008-09-25
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