Invention Grant
US08009270B2 Uniform background radiation in maskless lithography 有权
无掩模光刻中的均匀背景辐射

Uniform background radiation in maskless lithography
Abstract:
A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.
Public/Granted literature
Information query
Patent Agency Ranking
0/0