Invention Grant
US08009271B2 Projection optical system, exposure apparatus, exposure system, and exposure method
有权
投影光学系统,曝光装置,曝光系统和曝光方法
- Patent Title: Projection optical system, exposure apparatus, exposure system, and exposure method
- Patent Title (中): 投影光学系统,曝光装置,曝光系统和曝光方法
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Application No.: US11793402Application Date: 2005-12-09
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Publication No.: US08009271B2Publication Date: 2011-08-30
- Inventor: Yasuhiro Omura
- Applicant: Yasuhiro Omura
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-364270 20041216
- International Application: PCT/JP2005/022648 WO 20051209
- International Announcement: WO2006/064728 WO 20060622
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A projection optical system PL for forming an image of a first plane M on a second plane P has at least one first wedge prism 4 each of an entrance surface and an exit surface of which has a plane and in which a predetermined first wedge angle is made between the plane of the entrance surface and the plane of the exit surface, and when a coordinate system is so defined that a Z-axis direction is set along a direction of a normal to the first plane M, an X-axis direction along a direction of an intersecting line between the plane of the entrance surface and the plane of the exit surface, and a Y-axis direction along a direction perpendicular to the Z-axis direction and the X-axis direction, the first wedge prism 4 is arranged rotatably substantially around the Y-axis direction.
Public/Granted literature
- US20080018870A1 Projection Optical System, Exposure Apparatus, Exposure System, And Exposure Method Public/Granted day:2008-01-24
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