Invention Grant
US08009271B2 Projection optical system, exposure apparatus, exposure system, and exposure method 有权
投影光学系统,曝光装置,曝光系统和曝光方法

  • Patent Title: Projection optical system, exposure apparatus, exposure system, and exposure method
  • Patent Title (中): 投影光学系统,曝光装置,曝光系统和曝光方法
  • Application No.: US11793402
    Application Date: 2005-12-09
  • Publication No.: US08009271B2
    Publication Date: 2011-08-30
  • Inventor: Yasuhiro Omura
  • Applicant: Yasuhiro Omura
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2004-364270 20041216
  • International Application: PCT/JP2005/022648 WO 20051209
  • International Announcement: WO2006/064728 WO 20060622
  • Main IPC: G03B27/42
  • IPC: G03B27/42
Projection optical system, exposure apparatus, exposure system, and exposure method
Abstract:
A projection optical system PL for forming an image of a first plane M on a second plane P has at least one first wedge prism 4 each of an entrance surface and an exit surface of which has a plane and in which a predetermined first wedge angle is made between the plane of the entrance surface and the plane of the exit surface, and when a coordinate system is so defined that a Z-axis direction is set along a direction of a normal to the first plane M, an X-axis direction along a direction of an intersecting line between the plane of the entrance surface and the plane of the exit surface, and a Y-axis direction along a direction perpendicular to the Z-axis direction and the X-axis direction, the first wedge prism 4 is arranged rotatably substantially around the Y-axis direction.
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