Invention Grant
US08009272B2 Method and device for image measurement, exposure apparatus, substrate for image measurement, and device manufacturing method
有权
用于图像测量的方法和装置，用于图像测量的曝光装置，基板和装置制造方法
- Patent Title: Method and device for image measurement, exposure apparatus, substrate for image measurement, and device manufacturing method
- Patent Title (中): 用于图像测量的方法和装置，用于图像测量的曝光装置，基板和装置制造方法
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Application No.: US12118959Application Date: 2008-05-12
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Publication No.: US08009272B2Publication Date: 2011-08-30
- Inventor: Akinori Ohkubo
- Applicant: Akinori Ohkubo
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2007-134943 20070522
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An image measurement method is provided for measuring an image of a pattern of a mask projected with a projection optical system. The method includes the steps of detecting light transmitted through an aperture while a substrate is arranged at an image plane of the projection optical system, the substrate having a slit and the aperture having a width larger than a width of the slit; adjusting an alignment angle of the slit on the basis of a signal related to the light detected in the detecting; and measuring the image by detecting light transmitted through the slit while moving the slit, the alignment angle of which has been adjusted in the adjusting, in the image plane of the projection optical system.
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