Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US12245207Application Date: 2008-10-03
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Publication No.: US08009273B2Publication Date: 2011-08-30
- Inventor: Hiroyuki Wada
- Applicant: Hiroyuki Wada
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2007-262730 20071005
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
This invention provides an exposure apparatus configured to expose a pattern of an original on a substrate through a projection optical system. The apparatus comprises a holding unit configured to hold the projection optical system, at least three anti-vibration mounts configured to support the holding unit, and at least three supporting members configured to support the at least three anti-vibration mounts respectively. The at least three supporting members are independent of each other without connecting to each other.
Public/Granted literature
- US20090091733A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-09
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