Invention Grant
US08009285B2 Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
有权
光掩模安装/壳体装置和抗蚀剂检查方法和使用其的抗蚀剂检查装置
- Patent Title: Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
- Patent Title (中): 光掩模安装/壳体装置和抗蚀剂检查方法和使用其的抗蚀剂检查装置
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Application No.: US12341208Application Date: 2008-12-22
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Publication No.: US08009285B2Publication Date: 2011-08-30
- Inventor: Yoshikazu Katou , Takahiro Igeta , Hideyuki Moribe , Ryuji Hasegawa
- Applicant: Yoshikazu Katou , Takahiro Igeta , Hideyuki Moribe , Ryuji Hasegawa
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2007-330488 20071221
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A resist inspection apparatus is provided which has a configuration in which a reticle is separated from a pellicle. A reticle cassette is made up of two pieces of plate members. A hollowed portion with a shape allowing the reticle to be inserted into the plate member. Another hollowed portion having a shape being slightly larger than that of the resist of the reticle is formed on the plate member. In the circumference of the hollowed portion is placed a pellicle frame on which a protective film is formed in a stretched manner. In the concave portion is housed in the reticle with a resist on the reticle directed toward the hollowed portion. The reticle is put in sealed space.
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