Invention Grant
- Patent Title: Crystallization apparatus, crystallization method, device, and light modulation element
- Patent Title (中): 结晶装置,结晶方法,装置和光调制元件
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Application No.: US12962750Application Date: 2010-12-08
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Publication No.: US08009345B2Publication Date: 2011-08-30
- Inventor: Yukio Taniguchi , Masakiyo Matsumura , Kazufumi Azuma , Tomoya Kato , Takahiko Endo
- Applicant: Yukio Taniguchi , Masakiyo Matsumura , Kazufumi Azuma , Tomoya Kato , Takahiko Endo
- Applicant Address: JP Yokohama-shi
- Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee: Advanced LCD Technologies Development Center Co., Ltd.
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-076609 20070323
- Main IPC: G02F1/01
- IPC: G02F1/01

Abstract:
A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.
Public/Granted literature
- US20110075237A1 CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, DEVICE, AND LIGHT MODULATION ELEMENT Public/Granted day:2011-03-31
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