Invention Grant
- Patent Title: Optical system and method for use in projection systems
- Patent Title (中): 用于投影系统的光学系统和方法
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Application No.: US10575565Application Date: 2004-10-17
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Publication No.: US08009358B2Publication Date: 2011-08-30
- Inventor: Zeev Zalevsky , Yuval Kapellner , Izhar Eyal , Golan Manor
- Applicant: Zeev Zalevsky , Yuval Kapellner , Izhar Eyal , Golan Manor
- Applicant Address: IL Hertzliya
- Assignee: Explay Ltd.
- Current Assignee: Explay Ltd.
- Current Assignee Address: IL Hertzliya
- Agency: Browdy and Neimark, PLLC
- International Application: PCT/IL2004/000951 WO 20041017
- International Announcement: WO2005/036211 WO 20050421
- Main IPC: G02B27/10
- IPC: G02B27/10

Abstract:
An optical system and method are presented to produce a desired illuminating light pattern. The system comprises a light source system configured and operable to produce structured light in the form of a plurality of spatially separated light beams; and a beam shaping arrangement. The beam shaping arrangement is configured as a diffractive optical unit configured and operable to carry out at least one of the following: (i) combining an array of the spatially separated light beams into a single light beam thereby significantly increasing intensity of the illuminating light; (ii) affecting intensity profile of the light beam to provide the illuminating light of a substantially rectangular uniform intensity profile.
Public/Granted literature
- US20070273957A1 Optical System and Method for Use in Projection Systems Public/Granted day:2007-11-29
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