Invention Grant
US08009711B2 Etched-facet ridge lasers with etch-stop 有权
具有蚀刻停止的蚀刻面脊激光器

Etched-facet ridge lasers with etch-stop
Abstract:
A photonic device incorporates an epitaxial structure having an active region, and which includes a wet etch stop layer above, but close to, the active region. An etched-facet ridge laser is fabricated on the epitaxial structure by dry etching followed by wet etching. The dry etch is designed to stop before reading the depth needed to form the ridge. The wet etch completes the formation of the ridge and stops at the wet etch stop layer.
Public/Granted literature
Information query
Patent Agency Ranking
0/0