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US08010228B2 Process monitoring apparatus and method for monitoring process 有权
过程监控设备及监控过程方法

Process monitoring apparatus and method for monitoring process
Abstract:
A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operation time or an operation timing, etc. Furthermore, unauthorized use is prevented by storing a keyword in an ROM of the process monitor.
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