Invention Grant
- Patent Title: Multi-gas flow device
- Patent Title (中): 多气流装置
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Application No.: US12578296Application Date: 2009-10-13
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Publication No.: US08010303B2Publication Date: 2011-08-30
- Inventor: Chiun Wang , John M. Lull , William S. Valentine
- Applicant: Chiun Wang , John M. Lull , William S. Valentine
- Applicant Address: US PA Hatfield
- Assignee: Brooks Intrument, LLC
- Current Assignee: Brooks Intrument, LLC
- Current Assignee Address: US PA Hatfield
- Agency: SNR Denton US LLP
- Main IPC: G01F1/00
- IPC: G01F1/00

Abstract:
A system and method of characterizing or controlling a flow of a fluid is provided that involves a sensor conduit and a bypass. A plurality of fluids may be utilized in the flow control device based on characteristic information of the device generated during calibration thereof. The characteristic information, in turn is based on a dimensionless parameters, such as adjusted dynamic pressure and adjusted Reynolds number.
Public/Granted literature
- US20100070206A1 MULTI-GAS FLOW DEVICE Public/Granted day:2010-03-18
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