Invention Grant
US08011296B2 Supercritical fluid-assisted direct write for printing integrated circuits
失效
用于印刷集成电路的超临界流体辅助直接写入
- Patent Title: Supercritical fluid-assisted direct write for printing integrated circuits
- Patent Title (中): 用于印刷集成电路的超临界流体辅助直接写入
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Application No.: US12232913Application Date: 2008-09-25
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Publication No.: US08011296B2Publication Date: 2011-09-06
- Inventor: Gurtej Sandhu , Cem Basceri
- Applicant: Gurtej Sandhu , Cem Basceri
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Dickstein Shapiro LLP
- Main IPC: B41L27/00
- IPC: B41L27/00
Abstract:
High resolution patterns provided on a surface of a semiconductor substrate and methods of direct printing of such high resolution patterns are disclosed. The high resolution patterns may have dimensions less than 0.1 micron and are formed by a direct writing method employing a supercritical fluid comprising nanometer-sized particles, which may be optionally electrically charged.
Public/Granted literature
- US20090095216A1 Supercritical fluid-assisted direct write for printing integrated circuits Public/Granted day:2009-04-16
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