Invention Grant
- Patent Title: Cleaning device and a lithographic apparatus cleaning method
- Patent Title (中): 清洁装置和光刻设备清洁方法
-
Application No.: US12081170Application Date: 2008-04-11
-
Publication No.: US08011377B2Publication Date: 2011-09-06
- Inventor: Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marlus Beeren , Kornelis Tijmen Hoekerd
- Applicant: Anthonius Martinus Cornelis Petrus De Jong , Hans Jansen , Marco Koert Stavenga , Peter Franciscus Wanten , Bauke Jansen , Johannes Wilhelmus Jacobus Leonardus Cuijpers , Raymond Gerardus Marlus Beeren , Kornelis Tijmen Hoekerd
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B08B3/04
- IPC: B08B3/04
Abstract:
A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.
Public/Granted literature
- US20090015804A1 Cleaning device and a lithographic apparatus cleaning method Public/Granted day:2009-01-15
Information query
IPC分类:
