Invention Grant
- Patent Title: Imprint lithography
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Application No.: US11364497Application Date: 2006-03-01
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Publication No.: US08011915B2Publication Date: 2011-09-06
- Inventor: Klaus Simon
- Applicant: Klaus Simon
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/02
- IPC: B29C59/02

Abstract:
A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
Public/Granted literature
- US20070102838A1 Imprint lithography Public/Granted day:2007-05-10
Information query