Invention Grant
US08012251B2 Electroless plating bath and method for producing high-temperature apparatus member using the bath 有权
化学镀浴和使用该浴的高温装置构件的制造方法

  • Patent Title: Electroless plating bath and method for producing high-temperature apparatus member using the bath
  • Patent Title (中): 化学镀浴和使用该浴的高温装置构件的制造方法
  • Application No.: US12078284
    Application Date: 2008-03-28
  • Publication No.: US08012251B2
    Publication Date: 2011-09-06
  • Inventor: Hiroshi Yakuwa
  • Applicant: Hiroshi Yakuwa
  • Applicant Address: JP Tokyo
  • Assignee: Ebara Corporation
  • Current Assignee: Ebara Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Wenderoth, Lind & Ponack, L.L.P.
  • Priority: JP2007-088430 20070329
  • Main IPC: C23C18/34
  • IPC: C23C18/34
Electroless plating bath and method for producing high-temperature apparatus member using the bath
Abstract:
There is provided an electroless plating bath which makes it possible to form a diffusion barrier layer of a Re-based alloy, having a uniform thickness regardless of the shape and size of a workpiece, on the surface of a Ni-based alloy by a relatively simple method. The electroless plating bath for forming a Ni—Re—B alloy, containing not less than 50 at % of Re, on a substrate by electroless plating, has a pH of 6 to 8 and includes a metal supply source component containing Ni2+ and ReO4− at an equal equivalent in the range of 0.01 to 0.5 mol/L, a complexing agent component containing citric acid and at least one other organic acid, and a reducing agent component containing dimethylamine-borane.
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