Invention Grant
- Patent Title: Electroless plating bath and method for producing high-temperature apparatus member using the bath
- Patent Title (中): 化学镀浴和使用该浴的高温装置构件的制造方法
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Application No.: US12078284Application Date: 2008-03-28
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Publication No.: US08012251B2Publication Date: 2011-09-06
- Inventor: Hiroshi Yakuwa
- Applicant: Hiroshi Yakuwa
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2007-088430 20070329
- Main IPC: C23C18/34
- IPC: C23C18/34

Abstract:
There is provided an electroless plating bath which makes it possible to form a diffusion barrier layer of a Re-based alloy, having a uniform thickness regardless of the shape and size of a workpiece, on the surface of a Ni-based alloy by a relatively simple method. The electroless plating bath for forming a Ni—Re—B alloy, containing not less than 50 at % of Re, on a substrate by electroless plating, has a pH of 6 to 8 and includes a metal supply source component containing Ni2+ and ReO4− at an equal equivalent in the range of 0.01 to 0.5 mol/L, a complexing agent component containing citric acid and at least one other organic acid, and a reducing agent component containing dimethylamine-borane.
Public/Granted literature
- US20080241406A1 Electroless plating bath and method for producing high-temperature apparatus member using the bath Public/Granted day:2008-10-02
Information query
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