Invention Grant
US08012256B2 Method of fabricating a quasi-substrate wafer and semiconductor body fabricated using such a quasi-substrate wafer 有权
使用这种准基板晶片制造准基板晶片和半导体主体的方法

Method of fabricating a quasi-substrate wafer and semiconductor body fabricated using such a quasi-substrate wafer
Abstract:
Disclosed are a method of fabricating a quasi-substrate wafer with a subcarrier wafer and a growth layer, and a semiconductor body fabricated using such a quasi-substrate wafer. In the method of fabricating a quasi-substrate wafer, a growth substrate water is fabricated that is provided with a separation zone and comprises the desired material of the growth layer. The growth substrate wafer is provided with a stress that counteracts a stress generated by the formation of the separation zone, and/or the stress generated by the formation of the separation zone is distributed, by structuring a first main race of the growth substrate water and/or the separation zone, to a plurality of subregions along the first main face. The growth substrate wafer with separation zone exhibits no or only slight bowing.
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