Invention Grant
- Patent Title: Method of fabricating a quasi-substrate wafer and semiconductor body fabricated using such a quasi-substrate wafer
- Patent Title (中): 使用这种准基板晶片制造准基板晶片和半导体主体的方法
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Application No.: US11668718Application Date: 2007-01-30
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Publication No.: US08012256B2Publication Date: 2011-09-06
- Inventor: Georg Brüderl , Christoph Eichler , Uwe Strauss
- Applicant: Georg Brüderl , Christoph Eichler , Uwe Strauss
- Applicant Address: DE Regensburg
- Assignee: Osram Opto Semiconductor GmbH
- Current Assignee: Osram Opto Semiconductor GmbH
- Current Assignee Address: DE Regensburg
- Agency: Fish & Richardson P.C.
- Priority: DE102006004398 20060131; DE102006007293 20060216
- Main IPC: C30B29/06
- IPC: C30B29/06

Abstract:
Disclosed are a method of fabricating a quasi-substrate wafer with a subcarrier wafer and a growth layer, and a semiconductor body fabricated using such a quasi-substrate wafer. In the method of fabricating a quasi-substrate wafer, a growth substrate water is fabricated that is provided with a separation zone and comprises the desired material of the growth layer. The growth substrate wafer is provided with a stress that counteracts a stress generated by the formation of the separation zone, and/or the stress generated by the formation of the separation zone is distributed, by structuring a first main race of the growth substrate water and/or the separation zone, to a plurality of subregions along the first main face. The growth substrate wafer with separation zone exhibits no or only slight bowing.
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