Invention Grant
US08012303B2 Container cleanliness measurement apparatus and method, and substrate processing system
有权
集装箱清洁度测量装置和方法，以及基板处理系统
- Patent Title: Container cleanliness measurement apparatus and method, and substrate processing system
- Patent Title (中): 集装箱清洁度测量装置和方法，以及基板处理系统
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Application No.: US12199960Application Date: 2008-08-28
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Publication No.: US08012303B2Publication Date: 2011-09-06
- Inventor: Tsuyoshi Moriya , Toshiya Matsuda
- Applicant: Tsuyoshi Moriya , Toshiya Matsuda
- Applicant Address: JP Tokyo
- Assignee: Tokyo Eletctron Limited
- Current Assignee: Tokyo Eletctron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-232644 20070907
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
A container cleanliness measurement apparatus capable of preventing particles from being adhered to substrates, while improving the operation efficiency of a container for housing substrates. An FOUP inspection apparatus includes a particle-separation promoting nozzle for promoting separation of particles adhered to an inner wall of an FOUP and to carries for holding peripheral portions of wafers inside the FOUP, a particle collecting nozzle for collecting particles separated from the inner wall of the FOUP, etc., and a particle counter for measuring an amount of collected particles. The particle-separation promoting nozzle and the particle collecting nozzle constitute a probe nozzle which is adapted to enter inside the FOUP.
Public/Granted literature
- US20090064760A1 CONTAINER CLEANLINESS MEASUREMENT APPARATUS AND METHOD, AND SUBSTRATE PROCESSING SYSTEM Public/Granted day:2009-03-12
Information query
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