Invention Grant
- Patent Title: Method for collection of valuable metal from ITO scrap
- Patent Title (中): 从ITO废料中收集贵重金属的方法
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Application No.: US12445310Application Date: 2007-06-27
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Publication No.: US08012337B2Publication Date: 2011-09-06
- Inventor: Yuichiro Shindo , Kouichi Takemoto
- Applicant: Yuichiro Shindo , Kouichi Takemoto
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Howson & Howson LLP
- Priority: JP2006-288185 20061024
- International Application: PCT/JP2007/062895 WO 20070627
- International Announcement: WO2008/053616 WO 20080508
- Main IPC: C25B11/04
- IPC: C25B11/04 ; C25C5/02 ; C25C1/22 ; C01G15/00 ; C22B58/00

Abstract:
Proposed is a method for collecting valuable metal from an ITO scrap by subjecting the ITO scrap to electrolysis and collecting the result as metallic indium. Specifically, the present invention proposes a method for selectively collecting metallic indium including the steps of subjecting the ITO scrap to electrolysis in an electrolytic bath partitioned with a diaphragm or an ion-exchange membrane, subsequently extracting anolyte temporarily, eliminating tin contained in the anolyte by a neutralization method, a replacement method or other methods, placing a solution from which the tin was eliminated in a cathode side again and performing electrolysis thereto; or a method for collecting valuable metal from an ITO scrap including the steps of obtaining a solution of In or Sn in an ITO electrolytic bath, eliminating the Sn in the solution, and collecting In in the collecting bath. These methods enable the efficient collection of metallic indium from an ITO scrap of an indium-tin oxide (ITO) sputtering target or an ITO scrap such as ITO mill ends arisen during the manufacture of such ITO sputtering target.
Public/Granted literature
- US20100084281A1 Method for Collection of Valuable Metal from ITO Scrap Public/Granted day:2010-04-08
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