Invention Grant
- Patent Title: Template pattern density doubling
- Patent Title (中): 模板密度倍增
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Application No.: US12344100Application Date: 2008-12-24
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Publication No.: US08012394B2Publication Date: 2011-09-06
- Inventor: Sidlgata V. Sreenivasan
- Applicant: Sidlgata V. Sreenivasan
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: B28B11/08
- IPC: B28B11/08
Abstract:
A sub-master template is patterned to provide at least double the density of features of a master template. The sub-master template and master template may employ the use of alignment marks during the patterning process.
Public/Granted literature
- US20090166933A1 Template Pattern Density Doubling Public/Granted day:2009-07-02
Information query
