Invention Grant
- Patent Title: Template having alignment marks formed of contrast material
- Patent Title (中): 具有由对比材料形成的对准标记的模板
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Application No.: US12464487Application Date: 2009-05-12
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Publication No.: US08012395B2Publication Date: 2011-09-06
- Inventor: Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
- Applicant: Kosta S. Selinidis , Byung-Jin Choi , Gerard M. Schmid , Ecron D. Thompson , Ian Matthew McMackin
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Cameron A. King
- Main IPC: B28B11/08
- IPC: B28B11/08
Abstract:
Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
Public/Granted literature
- US20090250840A1 Template Having Alignment Marks Formed of Contrast Material Public/Granted day:2009-10-08
Information query
