Invention Grant
US08012400B2 Surface and site-specific polymerization by direct-write lithography
失效
通过直写光刻技术进行表面和位点特异性聚合
- Patent Title: Surface and site-specific polymerization by direct-write lithography
- Patent Title (中): 通过直写光刻技术进行表面和位点特异性聚合
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Application No.: US11966764Application Date: 2007-12-28
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Publication No.: US08012400B2Publication Date: 2011-09-06
- Inventor: Chad A. Mirkin , Xiaogang Liu , Shouwu Guo
- Applicant: Chad A. Mirkin , Xiaogang Liu , Shouwu Guo
- Applicant Address: US IL Evanston
- Assignee: Northwestern University
- Current Assignee: Northwestern University
- Current Assignee Address: US IL Evanston
- Agency: Foley & Lardner LLP
- Main IPC: B29C35/08
- IPC: B29C35/08

Abstract:
Polymeric microstructures and nanostructures can be prepared with use of a tip to pattern a surface. A tip can be used to pattern a structure which can initiate polymerization. The structure can be then exposed to monomer to induce polymerization at the structure. Alternatively, a tip can be used to pattern a surface with a monomer in which the surface is treated with polymerization catalyst so that polymerization occurs at the patterning site. Ring-opening metathesis polymerization can be carried out with use of the tip to control the polymerization. The tip can be a sharp tip as used in for example an atomic force microscope tip. Norbornene types of monomers can be used. Biological macromolecules can be also prepared.
Public/Granted literature
- US20080167202A1 SURFACE AND SITE-SPECIFIC POLYMERIZATION BY DIRECT-WRITE LITHOGRAPHY Public/Granted day:2008-07-10
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